Lin CJ, Lin CK, Chang CW, Chueh YL, Kuo HC, Diau EWG, Chou LJ,Lin GR,Photoluminescence of plasma enhanced chemical vapor deposition amorphous silicon oxide with silicon nanocrystals grown at different fluence ratios and substrate temperatures.,Jpn. J. Appl. Phys. Part 1 - Regul. Pap. Brief Commun. Rev. Pap., pp1040,(SCI)
95
(SCI)
Photoluminescence of plasma enhanced chemical vapor deposition amorphous silicon oxide with silicon nanocrystals grown at different fluence ratios and substrate temperatures.
Jpn. J. Appl. Phys. Part 1 - Regul. Pap. Brief Commun. Rev. Pap.
Lin CJ, Lin CK, Chang CW, Chueh YL, Kuo HC, Diau EWG, Chou LJ,Lin GR
45
1040
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